Project

General

Profile

Wiki » History » Revision 11

Revision 10 (David Lanzendörfer, 08/10/2021 12:21 AM) → Revision 11/16 (David Lanzendörfer, 08/10/2021 12:22 AM)

h1. Maskless lithography 

 A minimalist, maximally inexpensive patterning system for exposing 50 micron patterns onto photo resist. 
 For cost reasons we use long wave UV light , which allows us to use the much less expensive visible light DMD chips from Texas Instruments, which can operate with UV light down to 400nm, in combination with the ma-P 1200G resist (PDF provided), which has a sensitivity between 350nm and 450nm. 

 h2. Candidates for DMD chips 

 | *Name* | *Amount* | *Long description* | *Link* | *Price* | 
 | DMD Chip | 1 | DLP2000: DLP display suitable for visible UV light | https://www.ti.com/dlp-chip/display-and-projection/pico-chipsets/getting-started.html || 
 | Linear actuator | 2 | Linear actuator with a precision of 20um~30um | https://www.aliexpress.com/item/4001272086575.html || 
 | UV LED | 1 | UV LED in the visible spectrum (420nm) | https://eu.mouser.com/ProductDetail/Inolux/IN-3531SCUV-U70?qs=b%252BbDuRW3oLzkxuDRNctYRA%3D%3D || | 
 | IR LED | 4 | L13072-0120K: IR LED for shining through the wafer in order to detect the alignment markers, wave length: 1200 nm 
  | https://www.hamamatsu.com/eu/en/product/type/L13072-0120K/index.html ||