Wiki » History » Revision 12
Revision 11 (David Lanzendörfer, 08/10/2021 12:22 AM) → Revision 12/16 (David Lanzendörfer, 08/14/2021 09:55 PM)
h1. Maskless lithography A minimalist, maximally inexpensive patterning system for exposing 50 micron patterns onto photo resist. For cost reasons we use long wave UV light , which allows us to use the much less expensive visible light DMD chips from Texas Instruments, which can operate with UV light down to 400nm. 400nm, in combination with the ma-P 1200G resist (PDF provided), which has a sensitivity between 350nm and 450nm. h2. Candidates for DMD chips | *Name* | *Amount* | *Long description* | *Link* | *Price* | | DMD Chip | 1 | DLP2000: DLP display suitable for visible UV light | https://www.ti.com/dlp-chip/display-and-projection/pico-chipsets/getting-started.html || | Linear actuator | 2 | Linear actuator with a precision of 20um~30um | https://www.aliexpress.com/item/4001272086575.html || | UV LED | 1 | UV LED in the visible spectrum (420nm) | https://eu.mouser.com/ProductDetail/Inolux/IN-3531SCUV-U70?qs=b%252BbDuRW3oLzkxuDRNctYRA%3D%3D || | IR LED | 4 | L13072-0120K: IR LED for shining through the wafer in order to detect the alignment markers, wave length: 1200 nm | https://www.hamamatsu.com/eu/en/product/type/L13072-0120K/index.html || h2. Resist | *Name* | *Thickness* | *Type* | *Wavelengths* | | AZ1512 | 1.2um | positive | 310-440 nm | | AZ9260 | 5-20 um | positive | 365-435 nm |