Wiki » History » Revision 15
Revision 14 (David Lanzendörfer, 08/14/2021 11:59 PM) → Revision 15/16 (David Lanzendörfer, 08/15/2021 12:00 AM)
h1. Maskless lithography A minimalist, maximally inexpensive patterning system for exposing 50 micron patterns onto photo resist. For cost reasons we use long wave UV light , which allows us to use the much less expensive visible light DMD chips from Texas Instruments, which can operate with UV light down to 400nm. h2. Candidates for DMD chips | *Name* | *Amount* | *Long description* | *Link* | *Price* | | DMD Chip | 1 | DLP2000: DLP display suitable for visible UV light | https://www.ti.com/dlp-chip/display-and-projection/pico-chipsets/getting-started.html || | Linear actuator | 2 | Linear actuator with a precision of 20um~30um | https://www.aliexpress.com/item/4001272086575.html || | UV LED | 1 | UV LED in the visible spectrum (420nm) | https://eu.mouser.com/ProductDetail/Inolux/IN-3531SCUV-U70?qs=b%252BbDuRW3oLzkxuDRNctYRA%3D%3D || | IR LED | 4 | L13072-0120K: IR LED for shining through the wafer in order to detect the alignment markers, wave length: 1200 nm | https://www.hamamatsu.com/eu/en/product/type/L13072-0120K/index.html || h2. Resist | *Name* | *Thickness* | *Type* | *Wavelengths* | *Developer* | | AZ 1512 | 1.2 um | positive | 310-440 nm | | | AZ 9260 | 5-20 um | positive | 365-435 nm | | | AZ 4210 AZ4210 | 2–4 um | positive | 350-450nm | KOH |